techniques: Laser and Optical

Optical microscopy and spectroscopy techniques are often the first step for characterizing a new material, contaminant or device. Our facilities offer a wide range of both standard and specialized tools that fall in this category

OPTICAL MICROSCOPY

Our facilities offer a number of optical microscopes for routine use in addition to more sophisticated 3D optical microscopes that utilize interferometric methods to obtain high-resolution surface profiles.

Our current range of optical microscopy tools can be found here:

KECK-II, EPIC, PNF, ANTEC

RAMAN SPECTROSCOPY

Raman spectroscopy is a vibrational spectroscopy technique, traditionally used to identify the molecular “fingerprint” to help identify chemical structures. The technique is also widely used in the field of 2D materials and can provide additional information about material properties such as crystal orientation or internal stresses.

Our current range of Raman microscopy tools can be found in our SPID Facility.

ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY

One of the less common techniques available, UPS offers the ability to measure molecular orbital energies. The technique is extremely surface sensitive and is often used to analyze adsorbed species and their orientation on a surface.

Our current range of UPS tools can be found on our Keck-II Facility.

FOURIER TRANSFORM INFRARED SPECTROSCOPY (FTIR)

FTIR is a powerful and widely applicable vibrational spectroscopy technique to study chemical bonding and identify molecular structures. The technique can be applied to liquid, solid or gaseous samples and our facilities are also equipped with FTIR microscopy to analyze small specimens or areas of interest.

Our current range of FTIR tools can be found in our Keck-II Facility.

ELLIPSOMETRY and REFLECTOMETRY

Somewhat related techniques, these tools can both be used to measure thin film thickness. Reflectometry is a simpler and more convenient technique, but spectroscopic ellipsometry is superior in analysis of very thin films or complicated film stacks. These techniques can also be applied to measure optical constants for new materials.

Our current range of ellipsometery and reflectometry tools can be found:

Keck-II
NUFAB
PNF 

DYNAMIC LIGHT SCATTERING (DLS)

DLS techniques can be used to measure particle size distributions in solution. The technique can be applied to various types of particles and suspensions from proteins and polymers to inorganic particles. The same DLS systems can also often be used to measure zeta potential.

Our current range of DLS  tools can be found in our Keck-II and ANTEC Facilties.

CONTACT ANGLE MEASUREMENT

Contact angle measurement is used to analyze the hydrophilicity or wetting characteristics of a surface. This can be used to understand the properties of a coating, exposure of a surface to contamination or effectiveness of a surface treatment.

Our current range of contact angle measurement tools can be found in our NUFAB Facility.

Dr. Xinqi Chen

Dr. Xinqi Chen

Research Associate Professor Keck-II Facility Manager

Office: Tech AG95
(847) 491-5505 / email

Dr. Gajendra S. Shekhawat

Dr. Gajendra S. Shekhawat

SPID Facility Manager; Research Professor, Dept. of Material Science & Engineering

OFFICE: Tech AG94
(847) 491-3204 / Email