techniques: Patterning
Patterning and lithography are essential components for the design of electronic devices. Our facility offers a number of unique tools to meet users’ needs.
PHOTOLITHOGRAPHY
Photolithography is a standard microfabrication process used to either add new material in desired areas or remove material from undesired areas. Through the state-of-the-art instruments available in our facility, users have the capability and flexibility to design desired patterns in a rapid fashion.
Our current range of photolithography setups can be found in our NUFAB and PNF Facilities.
ELECTRON BEAM LITHOGRAPHY
Electron beam lithography is a high-resolution lithography technique that involves rastering an electron beam across the sample to selectively define areas for the deposition of new material or removal of existing material. This maskless nanolithography tool can be used to design electrical circuits, as well as, create nanostructures for various electronic or optical applications.
Our current range of electron beam lithography setups can be found in our EPIC-SEM and PNF Facilities.
ION BEAM LITHOGRAPHY
Ion beam lithography involves the use of a focused beam of ions directed onto a surface to fabricate small structures. The use of ions allows for very directional deposition of material onto the target sample with extremely high spatial resolution. The use of this method allows for the design of integrated circuits and nanostructures.
Our current range of ion beam lithography setups can be found EPIC Facility.
PARALLEL PEN LITHOGRAPHY
Parallel pen lithography involves the use of multiple nozzles for deposition of material onto a target sample. This direct-write lithography process allows for depositing patterns over large areas with high spatial resolution and has shown promise for biosensing applications.
Our current range of parallel pen lithography setups can be found at TERA-print.
